Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Responsibility:

PECVD

PECVD2

Plasma Enhanced Chemical Vapor Deposition

Oxford Instruments PECVD 80+

Plasma assisted deposition of dielectric layers
Sample size up to 6”
Base pressure 2 mTorr
RF 13.56 MHz and LF 40 kHz generators for stress-free layers
2.5% SiH₄ in N₂, NH₃, N₂O gas
CF₄, O₂ for reactor cleaning
SiO_x, SiO_xN_y and SiN_x

Oxford Instruments PECVD Plasma Pro 80 (PECVD2)

Plasma assisted deposition of dielectric layers
Sample size up to 6”
RF 13.56 MHz and LF 40 kHz
2.5% SiH₄, in N₂, NH₃, N₂O ,CF₄, N₂
SiOx, SiOxNy and SiNx
Endpointdetection for Plasma Cleaning