Homepage
Navigation
Search
Content
Footer
Contact
Sitemap
FIRST - Center for Micro- and Nanoscience
Main Navigation
Menu
Homepage
The Center
To homepage
Main menu
The Center
See overview
close
Mission
Organisation
Access
To homepage
The Center
Access
See overview
Project submission
Check-In
Check-Out
Operating hours
Visitors
Jobs
How to Find Us
People
To homepage
Main menu
People
See overview
close
Coordinator
Operation Team
Technical Team
Administration
Board Members
People A-Z
Alumni
Equipment
To homepage
Main menu
Equipment
See overview
close
Research Equipment
To homepage
Equipment
Research Equipment
See overview
Annealing
Atomic Force Microscopy (AFM)
Atomic Layer Deposition (ALD)
Bonding
Capacitance-Voltage Profiling (CV)
Electrical Testing (Probing)
Electron-Beam Evaporation
Electron-Beam Lithography (EBL)
Electroplating of Gold
Hall Effect Measurement
Inductively-Coupled Plasma Etching (ICP)
KOYO oven
Lapping
Laserwriter
Magnetron Sputtering
Maskaligners
Metal-Organic Vapor Phase Epitaxy (MOVPE)
Micromanipulation
Molecular Beam Epitaxy (MBE)
Optical Microscopy
Optical Reflectometry
Photoluminescence Mapping (PLM)
Photoresist Spinning
Plasma-Enhanced Chemical Vapor Deposition (PECVD)
Reactive Ion Etching (RIE)
Scanning Electron Microscopy (SEM)
Spectroscopic Ellipsometry
Surface Profiling
Wafer Cleaning
Wafer Cutting
Wet Etching
X-ray Diffraction (XRD)
Display all
Display less
Chemicals
Cleanroom infrastructure
IT Services
Safety
Education & Training
To homepage
Main menu
Education & Training
See overview
close
Introduction Day
Mentoring
Equipment Training
Lectures
Safety & Health
Research Activities
To homepage
Main menu
Research Activities
See overview
close
Projects
To homepage
Research Activities
Projects
See overview
Projects in 2024
Projects in 2023
Projects in 2022
Collaborations with Industry
Publications
To homepage
Research Activities
Publications
See overview
Publications 2024
Publications 2023
Publications 2022
Publications 2021
Publications 2020
Publications 2019
Publications 2018
Publications 2017
Publications 2016
Publications 2015
Publications 2014
Publications 2013
Publications 2012
Publications 2011
Publications 2010
Publications 2009
Publications 2008
Publications 2007
Publications 2006
Publications 2005
Publications 2004
Publications 2003
Publications 2002
Display all
Display less
FIRST-CLA
(active)
To homepage
Main menu
FIRST-CLA
See overview
close
Access
Equipment
To homepage
FIRST-CLA
Equipment
See overview
Research Equipment
To homepage
Equipment
Research Equipment
See overview
Wafer Cutting CLA
Bonding CLA
Lithography CLA
Characterization CLA
Deposition CLA
Plasma Processing, CLA
Wet Processing, CLA
Research Activities
To homepage
FIRST-CLA
Research Activities
See overview
Projects
To homepage
Research Activities
Projects
See overview
Projects 2021
Projects 2022
People
To homepage
FIRST-CLA
People
See overview
Operation Team
Administration
Technical Team
Management Team
Services
Student portal
Alumni association
Staffnet
Login
Search
EN
Departments
ETH Zurich
FIRST
Language Selection
English
You are here
Homepage
chevron_right
FIRST-CLA
chevron_right
…
Equipment
chevron_right
Research Equipment
chevron_right
Wet Processing, CLA
Wet Processing, CLA
Open all
Close all
Wet Benches, CLA
Responsibility:
Donat Scheiwiller
Wet Benches Photolithography, CLA
Responsibility:
Donat Scheiwiller
vacant
Critical Point Dryer, CLA
Responsibility:
Donat Scheiwiller
Donghoon Kim
Related Content
chevron_right
Wafer Cutting CLA
chevron_right
Bonding CLA
chevron_right
Lithography CLA
chevron_right
Characterization CLA
chevron_right
Deposition CLA
chevron_right
Plasma Processing, CLA
chevron_left
Research Equipment
JavaScript has been disabled in your browser
