Reactive Ion Etching (RIE)

Responsibility:

RIE NGP 80:

RIE 80:

Reactive Ion Etching NGP80

RIE NGP 80 Insulators (Oxford Instruments)

Plasma etching of dielectric layers and photoresists
Sample size up to 6”
Base pressure <5x10^-5 Torr
RF 13.56 MHz (500W) generator
CHF₃, CF₄, SF₆, O₂, Ar gas
OES (Optical Emissions Spectroscopy)

Ractive Ion Etching RIE80

RIE 80 Insulators (Oxford Instruments)

Plasma etching of metals, polymers and other materials
Sample size up to 6”
Base pressure < 5x10^-5 Torr
RF 13.56 MHz (500W) generator
CHF₃, CF₄, SF₆, O₂, Ar, N₂ gas