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Research Equipment
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Photoresist Spinning
Photoresist Spinning
Responsibility:
Sandro Loosli
-
Photolithography spinner bench in action.
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Two Spin Modules SM 180 BM
Spin dispensing of viscous photo resists, polyimides, PMMA etc.
Process controller with three row display
Parameters: Ramp, hold time, revolution speed
Max. three ramps, three holding times and one ramp down time
Air flow regulation with top cover
500-8000 rpm
Up to 4 inch substrates
Six Hotplates HP 160 III BM
Digital temperature controller with digital display of actual value, set point and ramp
Maximum specimen dimensions: 150 x 150 x 25 mm
3
Pneumatic substrate lift for loading/unloading wafers
Vacuum substrate fixation
Temperature range 25 - 200 °C
Temperature accuracy +/- 1 °C over 110 mm diameter @ 100 °C
Hot air fan oven UT6060
Inner space: 339 x 403 x 380 mm
3
Temperature range: max. 300 °C
Temperature accuracy:
@70 °C: +/- 2 °C
@150 °C: +/- 3 °C
@300 °C: +/- 7 °C
N
2
flushing possible
Control of fan speed
Vacuum dry cabinet VT6060M
Inner space: 371 x 415 x 345 mm
3
Temperature range: max. 200 °C
Ultimate vacuum: 1x10
-2
mbar
Related Content
chevron_right
Annealing
chevron_right
Atomic Force Microscopy (AFM)
chevron_right
Atomic Layer Deposition (ALD)
chevron_right
Bonding
chevron_right
Capacitance-Voltage Profiling (CV)
chevron_right
Electrical Testing (Probing)
chevron_right
Electron-Beam Evaporation
chevron_right
Electron-Beam Lithography (EBL)
chevron_right
Electroplating of Gold
chevron_right
Hall Effect Measurement
chevron_right
Inductively-Coupled Plasma Etching (ICP)
chevron_right
KOYO oven
chevron_right
Lapping
chevron_right
Laserwriter
chevron_right
Magnetron Sputtering
chevron_right
Maskaligners
chevron_right
Metal-Organic Vapor Phase Epitaxy (MOVPE)
chevron_right
Micromanipulation
chevron_right
Molecular Beam Epitaxy (MBE)
chevron_right
Optical Microscopy
chevron_right
Optical Reflectometry
chevron_right
Photoluminescence Mapping (PLM)
chevron_right
Plasma-Enhanced Chemical Vapor Deposition (PECVD)
chevron_right
Reactive Ion Etching (RIE)
chevron_right
Scanning Electron Microscopy (SEM)
chevron_right
Spectroscopic Ellipsometry
chevron_right
Surface Profiling
chevron_right
Wafer Cleaning
chevron_right
Wafer Cutting
chevron_right
Wet Etching
chevron_right
X-ray Diffraction (XRD)
chevron_left
Research Equipment
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