Photoresist Spinning

Responsibility:

Photolithography spinner bench — Photolithography spinner bench in action.

Spin dispensing of viscous photo resists, polyimides, PMMA etc.
Process controller with three row display
Parameters: Ramp, hold time, revolution speed
Max. three ramps, three holding times and one ramp down time
Air flow regulation with top cover
500-8000 rpm
Up to 4 inch substrates

Digital temperature controller with digital display of actual value, set point and ramp
Maximum specimen dimensions: 150 x 150 x 25 mm³
Pneumatic substrate lift for loading/unloading wafers
Vacuum substrate fixation
Temperature range 25 - 200 °C
Temperature accuracy +/- 1 °C over 110 mm diameter @ 100 °C

Inner space: 339 x 403 x 380 mm³
Temperature range: max. 300 °C
Temperature accuracy:
@70 °C: +/- 2 °C
@150 °C: +/- 3 °C
@300 °C: +/- 7 °C
N₂ flushing possible
Control of fan speed

Inner space: 371 x 415 x 345 mm³
Temperature range: max. 200 °C
Ultimate vacuum: 1x10^-2 mbar