Electron-Beam Evaporation

10 kV 0.6 A electron beam gun
Base pressure: main chamber below 2x10^-8 mbar, loadlock below 1x10^-7 mbar, integrated bakeout
Evaporation of metals (below 1x10^-7 mbar) and dielectrics (1x10^-6 ..1x10^-5 mbar)
8 pockets of 20 ccm volume, different liners depending on material
Materials: *Au* *Ti* Pt Cr Ge Al Ni Pd *Al₂O₃* *SiO₂* In₂O₃ ITO etc.
(materials *marked* are always present, others may change according to user requests)
Sample size up to 6 inch with uniformity of 5% uniformity over 6 inch, 2% over 4 inch
Sample holder with tilting
6 MHz crystal rate monitor (two crystals)
Ar sputter ion source with O2 line in loadlock, separated from main chamber

Electron beam evaporation of metals
10 keV electron beam energy, 10 kW power
Ti, Pt, Au, Cr, Ni, Ge, Ta (optional), Cu (optional), Pd (optional), W (Optional)
Sample size up to 4", 3 times 2"
8 cm³ pockets
Tiltable sample holder
6 MHz X-tal monitor (three crystals)
Ar sputter ion source