Maskaligners

Mask Aligners Photolithography — Photolitography room with special yellow lighting in order to avoid exposure of photosensitive surfaces.

Responsibility:

EVG 620 NT

Manual mask aligner for sample 4 x 4 mm², max size 6 inches
LED Light source @ 365 nm, 405 nm, 436 nm and “broadband” mix of all three wavelengths
Resolution: 500 nm
Accuracy: 100 nm
Split field alignment
Overlay backside alignment
IR - Backside

Responsibility:

Mask Aligner MJB3

Manual mask aligner for samples >= 4x4 mm², max. Size 3"
350 W Hg light source
Broadband light source 400 nm (350-450nm)
Resolution 500 nm
Accuracy 100 nm
Option for backside alignment with IR camera

Deep UV mask aligner

Manual mask aligner for UV/DUV lithography
1000 W Hg light source
220nm, 254nm, 365/405 nm wavelength
Resolution ~300 nm
Accuracy 100 nm
Split field alignment
Max. 2” wafer size

Responsibility:

Ultraviolett lamp

Large aperture high power UV light-source
5000 W Hg light source
253, 302, 312, 365 and 405 nm wavelength
150 mW/cm² intensity
4" diameter