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Research Equipment
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Maskaligners
Maskaligners
Photolitography room with special yellow lighting in order to avoid exposure of photosensitive surfaces.
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Mask aligner EVG 620 NT
Responsibility:
Amirmohammad Miran Zadeh
Ela Burmeister
Manual mask aligner for sample 4 x 4 mm
2
, max size 6 inches
LED Light source @ 365 nm, 405 nm, 436 nm and “broadband” mix of all three wavelengths
Resolution: 500 nm
Accuracy: 100 nm
Split field alignment
Overlay backside alignment
IR - Backside
Karl Süss mask aligner MJB3
Responsibility:
Quang Lung
Norbert Meier
Manual mask aligner for samples >= 4x4 mm
2
, max. Size 3"
350 W Hg light source
Broadband light source 400 nm (350-450nm)
Resolution 500 nm
Accuracy 100 nm
Option for backside alignment with IR camera
ABM deep UV mask aligner
Réka Vass
Manual mask aligner for UV/DUV lithography
1000 W Hg light source
220nm, 254nm, 365/405 nm wavelength
Resolution ~300 nm
Accuracy 100 nm
Split field alignment
Max. 2” wafer size
LOT-Oriel 500W Hg UV-Source
Responsibility:
Yargo Bonetti
Large aperture high power UV light-source
5000 W Hg light source
253, 302, 312, 365 and 405 nm wavelength
150 mW/cm
2
intensity
4" diameter
Related Content
chevron_right
Annealing
chevron_right
Atomic Force Microscopy (AFM)
chevron_right
Atomic Layer Deposition (ALD)
chevron_right
Bonding
chevron_right
Capacitance-Voltage Profiling (CV)
chevron_right
Electrical Testing (Probing)
chevron_right
Electron-Beam Evaporation
chevron_right
Electron-Beam Lithography (EBL)
chevron_right
Electroplating of Gold
chevron_right
Hall Effect Measurement
chevron_right
Inductively-Coupled Plasma Etching (ICP)
chevron_right
KOYO oven
chevron_right
Lapping
chevron_right
Laserwriter
chevron_right
Magnetron Sputtering
chevron_right
Metal-Organic Vapor Phase Epitaxy (MOVPE)
chevron_right
Micromanipulation
chevron_right
Molecular Beam Epitaxy (MBE)
chevron_right
Optical Microscopy
chevron_right
Optical Reflectometry
chevron_right
Photoluminescence Mapping (PLM)
chevron_right
Photoresist Spinning
chevron_right
Plasma-Enhanced Chemical Vapor Deposition (PECVD)
chevron_right
Reactive Ion Etching (RIE)
chevron_right
Scanning Electron Microscopy (SEM)
chevron_right
Spectroscopic Ellipsometry
chevron_right
Surface Profiling
chevron_right
Wafer Cleaning
chevron_right
Wafer Cutting
chevron_right
Wet Etching
chevron_right
X-ray Diffraction (XRD)
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Research Equipment
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