Wafer Cleaning

Responsibility:

UVOCS Cleaner:  

Plasma Asher:   

Ultra Violet Ozone Cleaning system

Ultra-Violet Ozone Cleaning (UVOCS)

UV ozone cleaning for organic contaminants and photoresist residues

  • 185nm and 254nm UV light generated by a low-pressure mercury vapor lamp
  • Damage-free clean surface for III-Vs
  • Sample size up to 10 inch
  • Room temperature process
Oxygen plasma asher

O2 Plasma Asher; Technics Plasma 100-E

  • O2 ashing of organic residues and photoresists on III/V substrates
  • 2.45 GHz 250W µW source
  • O2 gas, CF4 planned
  • Base pressure ~ 5 mTorr
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