Atomic Layer Deposition (ALD)
Picosun Sunale R-150B
- Atomic layer deposition of thin films
- Alumina (Al2O3)
- Titanium oxide
- Zinc oxide
- Nanolaminate (alumina and zinc oxide)
- Sample size 4" standard, capability up to 6”, manual loading
- 100 - 400°C deposition temperature
- TMA and water sources for alumina deposition
- TEMAH and water sources for hafnium oxide deposition
- Titanium isopropoxide and water sources for titanium oxide deposition
- DEZ and water sources for zinc oxide