Lithography CLA
Responsibility:
Nanoscribe GT2
The Nanoscribe GT2 system located at FIRST-CLA is a 3D printing tool for nano- and micro-scale fabrication
The system features are:
- 3D design freedom with sub-micron resolution
- Selection between various printing materials and substrates
- Galvo technology enables fast fabrication of micro-meter large structures
- User friendly interface
Responsibility:
Maskaligner Karl Süss MABA6:
- 200 – 1000 W Hg light source
- Broadband light source 400 nm (350-450nm)
- Split field alignment
- Wafer size up to 4 inch
- 5 inch masks
- Top side alignment (TSA): 0.5 μm alignment accuracy
- Bottom side alignment (BSA): 1 μm alignment accuracy
- Exposure modes: Soft, hard, vacuum contact, and proximity printing
- Exposure gap: 1 to 999 μm
