FIRST-Lab welcomes a new member in the equipment family
FIRST-Lab acquired new tool for state-of-the art mask alignment: mask aligner EVG 620 NT.
The new mask aligner EVG 620 NT will replace our old mask alignment system MA6. The new tool comes with a LED Light source, which can be adjusted to different intensities at wavelengths of 365 nm, 405 nm, 436 nm and a “broadband” mix of all three ones.
The new mask aligner EVG 620 NT offers all features of our old MA6 system. In addition, it is equipped with backside alignment, either as overlay storing the mask picture or as crosshair alignment. The EVG 620 NT can handle samples up to six inches and masks up to seven inches in size. It is also equipped with infrared-backside illumination, which allows for looking through samples made of materials that are transparent in the infrared wavelength range.