Lithography seminar on October 25th, 2018

The seminar is a tour through a typical photolithography process, starting with the correct choice of resists over softbake, exposure, development and finally removal of the resists. We will touch common problems in lithography processes (e.g. during etching or lift-off) and how to resolve them.
This presentation is recommended for users who are directly involved in photolithography processes. If users have a more general interest in this topic, it might be too special.

October 25th 2018
ETH Hönggerberg
HIL E 3
10:30am

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