Scanning Electron Microscopy (SEM)
Please note that our SEMs are dedicated to characterization within a process line only. For SEM measurements on samples not processed in our clean room, please contact the Scientific Center for Optical and Electron Microscopy.
- Digital Field Emission Scanning Electron Microscope
- 0.1-30 keV beam energy
- 1 - 1.7 nm resolution
- ZEISS Complete Detection System with ET, Inlens SE, EsB and AsB detectors
- Sample holders for chips, 2” and 4” substrates
- All 5 axes full motorized
- TIFF, BMP and JPG image up to 3072 x 2304 pixel resolution
Zeiss ULTRA plus with integrated charge compensation
- Digital Field Emission Scanning Electron Microscope
- 0.02 - 30 keV beam energy
- 1.7 nm resolution
- ZEISS detection system with Inlens SE, EsB and SE detectors
- Sample holders for chips, 2” and 4” substrates
- All 5 axes fully motorized
- TIFF, BMP and JPG image up to 3072 x 2304 pixel resolution
- AVI – Image capture software for recording of audiovisual interleaves
- Charge compensation: For isolating materials: resist, sapphire, glass, capton etc.
- OptiProbe: Software system to adjust the probe current continuously
Sputter system Pt (EM ACE200)
- Sputter coating of non-conductive SEM samples with Pt, PdAu or Au
- Ar plasma
- 3 different targets available: Pt, PdAu or Au
- Samples up to 4” diameter