Maskaligners
Photolitography room with special yellow lighting in order to avoid exposure of photosensitive surfaces.
- Manual mask aligner for sample 4 x 4 mm2, max size 6 inches
- LED Light source @ 365 nm, 405 nm, 436 nm and “broadband” mix of all three wavelengths
- Resolution: 500 nm
- Accuracy: 100 nm
- Split field alignment
- Overlay backside alignment
- IR - Backside
- Manual mask aligner for samples >= 4x4 mm2, max. Size 3"
- 350 W Hg light source
- Broadband light source 400 nm (350-450nm)
- Resolution 500 nm
- Accuracy 100 nm
- Option for backside alignment with IR camera
- Manual mask aligner for UV/DUV lithography
- 1000 W Hg light source
- 220nm, 254nm, 365/405 nm wavelength
- Resolution ~300 nm
- Accuracy 100 nm
- Split field alignment
- Max. 2” wafer size
- Large aperture high power UV light-source
- 5000 W Hg light source
- 253, 302, 312, 365 and 405 nm wavelength
- 150 mW/cm2 intensity
- 4" diameter